"Lean-enriched" planting method for film-covered corn in dryland

The so-called "poor water enrichment" planting method is a new type of cover cultivation technique based on the conventional film-mulching cultivation techniques. In addition to the traditional covering method to increase the temperature and protect the earthworms, it is mainly through the improvement of the coating method. The micro-collection flow field on the membrane enables natural rainfall, especially the ridge and furrow cover planting method, to be used for plowing and soil fertigation on the basis of the tile method. A ditch with a depth of 5 cm and a width of 10 cm. The 75 cm wide mulch with two rows of grooves and 120 cm wide mulch with three rows of grooves. Maize seeds were spotted in the trenches at a spacing of 40 cm and then covered with a film, or spotted after mulching. Two or three depressions are formed on the membrane after the film is covered. 2. After the trough-cover planting method is covered with conventional tiles, plows or shovels are used on the exposed side of the membrane to turn over the mulch on both sides of the film. Two small adomes of 5-10 cm in height are raised and a membrane trough is formed in the middle. Precipitation effectively collects under the membrane. Plant a row of corn on a 75 cm wide membrane trough and plant 3 rows of corn on a 120 cm wide trough. 3, seedlings cover the planting method according to the spacing of 100 cm, 65 to 70 cm from the dash line, two lines of digging nests (1000 / mu). Wo 30 cm in diameter and 25 cm in depth. Apply about 4 kg of agricultural fertilizer per litter, 20-30 grams of urea, and 40-50 grams of phosphate fertilizer. Then fill in the topsoil and mix it with the fertilizer in the nest. The time to dig nests is appropriate for the fall or early spring of the first year. When sowing, the middle dry soil of the nest was set between the rows. A flat-bottomed disk with a diameter of 20 cm was marked in the nest, 3 seedlings were kept in each nest in the dry area, and 4 seedlings were kept in each nest in the semi-arid area. The general density is 3000-4000 strains/mu. 4. On the basis of the conventional tile method, the low-hole cover planting method removes part of the topsoil at the time of sowing, so that the seeding hole forms a small hole with a diameter of 5 to 10 cm, and then seeds and covers the inside of the hole. 5. Water storage and high yield groove cover planting method This method is mainly used for slopes. In general, after the rain, people and livestock should be combined and man-machine integration should be used to build high-yield ditch. The specific construction method is: set the planting belt along the contour line from the edge of the slope, with a width of 1.2 meters. In the upper half of the belt, the ditch was 60 cm wide and 30 cm deep. The earth dug out in the ditch was used to build ridges in the lower half, and the ridge bottom was 60 cm wide and 30 cm high. It was inverted "U" shaped. Digging into the bottom of the ditch to dig 1 inch deep and 20 centimeters in depth. Fertilizer and chemical fertilizers will be applied to the bottom of the trench, and then the first zone will be filled with all the mature soil with a width of 1.2 meters and a thickness of 15 centimeters. . The first half of Yuanmushu soil is ditched in the upper part, the lower part is ridged, and the third band of mature soil is filled in the second belt ditch, followed by analogy. Its main function: First, it accumulates limited rainfall in the ditch for absorption and utilization by corn; Second, it increases the thickness of the living soil layer by 1 time after the soil is changed, and both fertilizes the soil and controls soil erosion. A further layer of plastic film was added to the storage ditch to increase the soil's ability to increase temperature and maintain soil moisture, which increased the altitude of corn planting and expanded the area. This is a new approach to high maize yield in mountain arid areas. The cover film is semi-covered and the cover groove is not ridged. The ground in the ditch is arched and half of the film is tightly bound to the earth bed. Leave 8 cm at the edge of the membrane and ridge to allow water to seep. Film selection of ultra-thin film, width 60-70 cm. Maize cultivation management technology, with the general film cover cultivation.

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